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vacuum vapor deposition method
释义
vacuum vapor deposition method
真空蒸发法
形成薄膜的一种方法。在真空度高於10{-5}毫米汞柱的钟罩内,对形成薄膜的物质进行加热,使之蒸发而淀积在基片上。
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更新时间:2025/3/10 11:24:58